Rational Strategy for Space-Confined Atomic Layer Deposition
Ryoma Kamei, Takuro Hosomi, Masaki Kanai, Eisuke Kanao, Jiangyang Liu, Tsunaki Takahashi, Wenjun Li, Wataru Tanaka, Kazuki Nagashima, Katsuya Nakano, Koji Otsuka, Takuya Kubo, and Takeshi Yanagida
Atomic layer deposition (ALD) offers excellent controllability of spatial uniformity, film thickness at the Angstrom level, and film composition even for high-aspect-ratio nanostructured surfaces, which are rarely attainable by other conventional deposition methodologies. Although ALD has been successfully applied to various substrates under open-top circumstances, the applicability of ALD to confined spaces has been limited because of the inherent difficulty of supplying precursors into confined spaces. Here, we propose a rational methodology to apply ALD growths to confined spaces (meter-long microtubes with an aspect ratio of up to 10 000). The ALD system, which can generate differential pressures to confined spaces, was newly developed. By using this ALD system, it is possible to deposit TiOx layers onto the inner surface of capillary tubes with a length of 1000 mm and an inner diameter of 100 μm with spatial deposition uniformity. Furthermore, we show the superior thermal and chemical robustness of TiOx-coated capillary microtubes for molecular separations when compared to conventional molecule-coated capillary microtubes. Thus, the present rational strategy of space-confined ALD offers a useful approach to design the chemical and physical properties of the inner surfaces of various confined spaces.
ACS Applied Materials and Interfaces: https://pubs.acs.org/doi/10.1021/acsami.3c01443